| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a gas adsorption device that allows a highly active gas adsorption agent prohibited to be left in atmosphere due to its quick reaction with air in a short period of time to be left in atmosphere and also suppresses its deterioration occurring upon its application to a vacuum equipment. <P>SOLUTION: The gas adsorption device 1 is constituted of a container 3 wherein a gas adsorption agent 2 is enclosed at a reduced pressure and a protrusion 4 disposed adjacent to the container 3. Since the container 3 is sealed, the gas adsorption agent 2 does not deteriorate so long as it is stored therein. When the gas adsorption device is applied to vacuum equipment, the protrusion 4 is pushed to the container 3 by virtue of atmospheric pressure pressing the vacuum equipment to form a through hole on the container 3. The gas adsorption agent 2 is thereby allowed to adsorb gas in the vacuum equipment via the through hole. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
