摘要 |
PROBLEM TO BE SOLVED: To correct two-fold symmetry third aberration S3 with respect to an electron beam device having a spherical aberration correction device. SOLUTION: When a Cs correction device 17 is operated, a parasitic aberration S3 (two-fold symmetry third aberration S3) is generated. Then, in the device of Fig.1, a two-fold symmetry third aberration S3 to counteract the parasitic aberration S3 is newly generated in a multipole 7, thereby correcting the parasitic aberration. In other words, electron beams EB are slanted against an optical axis O in the multipole 7 which generates six-polar fields and new two-fold symmetry third aberration S3 is introduced to each electron constituting the slanted electron beams EB. COPYRIGHT: (C)2008,JPO&INPIT
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