发明名称 ABERRATION CORRECTION METHOD AND ELECTRON BEAM DEVICE
摘要 PROBLEM TO BE SOLVED: To correct two-fold symmetry third aberration S3 with respect to an electron beam device having a spherical aberration correction device. SOLUTION: When a Cs correction device 17 is operated, a parasitic aberration S3 (two-fold symmetry third aberration S3) is generated. Then, in the device of Fig.1, a two-fold symmetry third aberration S3 to counteract the parasitic aberration S3 is newly generated in a multipole 7, thereby correcting the parasitic aberration. In other words, electron beams EB are slanted against an optical axis O in the multipole 7 which generates six-polar fields and new two-fold symmetry third aberration S3 is introduced to each electron constituting the slanted electron beams EB. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008059881(A) 申请公布日期 2008.03.13
申请号 JP20060234924 申请日期 2006.08.31
申请人 JEOL LTD 发明人 HOSOKAWA FUMIO
分类号 H01J37/153 主分类号 H01J37/153
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