| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To form a correction film in a halftone mask so as to correct a white defect generating in a semitransmitting film of the halftone mask. <P>SOLUTION: The defect correction method comprises imparting a correction film 4 to a halftone mask 1 having a white defect in a halftone portion 2 comprising a semitransmitting film. The correction film 4 for the semitransmitting film is deposited inside the white defect. When the correction film overflows to form an overlapped portion 4b, a slit 5 in a size of the resolution limit or less than that of an exposure apparatus is formed in a circumference edge of the correction film. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
