| 摘要 |
Provided is a tube-like mask for forming an image of a pattern on a substrate through a projection optical system. The mask has a pattern forming surface which is provided with the pattern formed thereon and is arranged around a prescribed shaft. The mask can be rotated, in synchronization with shift of the substrate at least in a prescribed one dimensional direction, with the prescribed shaft as a rotating shaft, and a condition of D=(ßOE)/p is satisfied, where D is the diameter of the mask on the pattern forming surface, L is the maximum length of the substrate in the one dimensional direction, ß is the projection magnification ratio of the projection optical system, and p is a circular constant. |
