发明名称 |
METHOD OF MANUFACTURING RESISTOR |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a resistor by which high dimensional accuracy can be achieved for end-face electrodes with a small size by suppressing the displacement of a mask disposed on the underside of a sheet insulating substrate when forming the end-face electrodes by sputtering. <P>SOLUTION: The method of manufacturing the resistor of the present invention includes the steps of: forming a reference side 18 by cutting at least one end of a sheet insulating substrate 11a relative to the pattern of a resistor 13 formed on the top surface of the sheet insulating substrate 11a; forming a plurality of slits 20 on the sheet insulating substrate 11a relative to the reference side 18; disposing, relative to the reference side 18, a mask 22 having openings 21 on the underside of the sheet insulating substrate 11a having the plurality of slits 20 formed thereon; and forming a plurality of pairs of end-face electrodes 15 on the underside of the sheet insulating substrate 11a and the inner surfaces of the plurality of slits 20 by sputtering in a state in which the mask 22 is disposed. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
申请公布号 |
JP2008060490(A) |
申请公布日期 |
2008.03.13 |
申请号 |
JP20060238480 |
申请日期 |
2006.09.04 |
申请人 |
MATSUSHITA ELECTRIC IND CO LTD |
发明人 |
SHIBUYA NAOKI;YAMADA HIROSHI;MATSUKAWA TOSHIKI |
分类号 |
H01C17/06;H01C17/12;H01C17/28 |
主分类号 |
H01C17/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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