发明名称 |
DRAWING METHOD, DRAWING APPARATUS, AND INFORMATION RECORDING MEDIUM |
摘要 |
PROBLEM TO BE SOLVED: To precisely draw a pattern on a drawing surface of an object in a short time. SOLUTION: An electron beam converged to an area MA of a substrate W rotating at a speed to be exposed by the electron beam is deflected periodically to a +X direction without blanking by applying a pulse voltage PV to a second deflection electrode 18. Thus, a beam spot SP of the electron beam can be periodically positioned on any track Tr<SB>m</SB>defined by the area MA, and the electron beam always contributes to the drawing of a mark M<SB>mn</SB>on either one of tracks Tr<SB>m</SB>. COPYRIGHT: (C)2008,JPO&INPIT
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申请公布号 |
JP2008059685(A) |
申请公布日期 |
2008.03.13 |
申请号 |
JP20060235419 |
申请日期 |
2006.08.31 |
申请人 |
RICOH CO LTD;KURESUTETSUKU:KK |
发明人 |
MIYAZAKI TAKESHI;MURAYAMA NOBORU |
分类号 |
G11B7/26;G11B7/0045 |
主分类号 |
G11B7/26 |
代理机构 |
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代理人 |
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地址 |
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