发明名称 LASER BEAM IRRADIATION APPARATUS AND METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a technique of improving production capacity by using no photolithography process and by simplifying processes, in the manufacturing processes of TFTs, an electronic circuit using TFTs, and a display apparatus formed by TFTs. <P>SOLUTION: A laser beam irradiation apparatus is disclosed which includes a laser oscillator for emitting a laser beam, an optical system for forming the laser beam into a linear beam on the surface of a workpiece, and a mask installed between the optical system and the workpiece. The linear beam is divided into a plurality of laser beams through the mask, with the workpiece irradiated by the plurality of laser beams. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008055467(A) 申请公布日期 2008.03.13
申请号 JP20060235522 申请日期 2006.08.31
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 KOMATA TAKASHI;TANAKA KOICHIRO
分类号 B23K26/073;B23K26/06;B23K26/067;G09F9/00;H01L21/20;H01L21/768 主分类号 B23K26/073
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