| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a technique to address the difficulty which arises due to the longer amount of time it takes to image a substrate using optical maskless lithography over a conventional lithography techniques using a mask. <P>SOLUTION: In optical maskless lithography, scanning of a single substrate is typically much slower than in conventional lithography. Solutions are described for the adoption of immersion lithography techniques into optical maskless lithography, and in particular, the present invention provides one or more solutions to reduce the amount of time which the immersion liquid is in contact with any given part of the top surface of the substrate during imaging. <P>COPYRIGHT: (C)2008,JPO&INPIT |
