| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a liquid immersion exposure apparatus that collects the liquid to the last drop from the space between the final surface of an projection optical system and a surface of a wafer at the time of electric power failure, and to provide a device manufacturing method. <P>SOLUTION: The liquid immersion exposure apparatus 100 having a liquid supplying mechanism 182 for supplying the liquid 180 in the space between the final surface of the projection optical system 140 and the surface of the wafer 170, and a first liquid collecting mechanism 190 for collecting the liquid 180 in the space comprises a gas supplying mechanism 200 and a second liquid collecting mechanism 300. A gas supplying nozzle 202 connected to the gas supplying mechanism 200 and a second liquid collecting nozzle 302 connected to the second liquid collecing meachanism 300 are arranged in mutually facing manner with the space sandwiched. The gas supplying mechanism 200 and the second liquid collecting mechanism 300 coincidentally operate at the time of the electric power failure to exclude the liquid 180 from the space. <P>COPYRIGHT: (C)2008,JPO&INPIT |
