| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for cleaning and drying a substrate for suppressing minute defects on the surface of the substrate, when drying the substrate by supplying an organic solvent vapor, such as IPA. SOLUTION: The method for cleaning/drying the substrate comprises: a process for performing the wet treatment of the surface of the substrate with each kind of chemical solution, and then rinsing it in a rinsing tank using demineralized water; a process for pulling up the substrate from the rinsing tank by controlling rise speed to predetermined speed, such as a finite value of not more than 2 mm/sec, by setting the substrate surface to a hydrophobic state after the rinsing is completed; and a process for removing moisture from the substrate surface by supplying a water-soluble organic solvent for reducing the surface tension of demineralized water to the substrate for a fixed amount of time after raising the substrate. COPYRIGHT: (C)2008,JPO&INPIT
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