发明名称 SUBSTRATE TREATMENT METHOD AND SUBSTRATE-TREATMENT DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method for preventing a dry core that becomes a starting point, when a dry region is formed on a substrate from being generated at least at two locations near the center of the substrate, when discharging cleaning liquid to the surface of the substrate from a discharge nozzle and performing scanning with the discharge nozzle for spin-drying the substrate. SOLUTION: When the substrate W is rotated about the longitudinal axis with a rotary motor by holding the substrate in a horizontal attitude with a spin chuck, the cleaning liquid is discharged from the discharge port of the pure-water discharge nozzle 20 to the surface of the substrate; and the discharge port of the pure-water discharge nozzle is scanned from a position that faces the center of the substrate, to a position that faces the periphery of the substrate, gas is sprayed from the jet of a gas jet nozzle 34 to the surface at the center of the substrate, before the second dry core is generated after a first dry core that becomes a starting point, when a dry region is formed on the substrate is generated near the center of the substrate, immediately after the start of moving the pure-water discharge nozzle. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008060103(A) 申请公布日期 2008.03.13
申请号 JP20060231565 申请日期 2006.08.29
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 GOTO TOMOHIRO;SANADA MASAKAZU;SHIGEMORI KAZUSHI;TAMADA OSAMU;YASUDA SHUICHI
分类号 H01L21/027;H01L21/304 主分类号 H01L21/027
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