| 摘要 |
An exposure apparatus which exposes a substrate to light is disclosed. The exposure apparatus for exposing a substrate to light, the apparatus comprises: a projection optical system configured to project light from a reticle onto the substrate, the projection optical system including at least one optical element driven to adjust aberration of the projection optical system; a driver configured to drive the at least one optical element; and a calculator configured to calculate a target amount to which the driver drives the at least one optical element, wherein the apparatus is configured so that the driver drives the at least one optical element a plurality of times based on outputs from the calculator in a non-exposure period during which the substrate is not exposed to light.
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