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发明名称
Lithographic apparatus and device manufacturing method
摘要
申请公布号
EP1424599(B1)
申请公布日期
2008.03.12
申请号
EP20030257496
申请日期
2003.11.27
申请人
ASML NETHERLANDS B.V.
发明人
SIMON, KLAUS;LOF, JOERI;MINNAERT, ARTHUR WINIFRED EDUARDUS;SMEETS, ERIK MARIE JOSE
分类号
G03F7/20;B01J19/00;C40B60/14
主分类号
G03F7/20
代理机构
代理人
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