Method of manufacturing liquid crystal display

摘要

A method for forming a liquid crystal display device includes several regions. After forming a gate line layer (121), a gate insulator (140), a semiconductor layer (150,160), a data layer (170) and a photoresist layer (50), a mask (40) is used to define a plurality of regions in the photoresist layer. Certain of the regions have different thickness of the photoresist layer after developing. While exposing the gate pad (129) and data pad (179), etching process is applied over both the gate pad and data pad at the same time. Then, a passivation layer (180) is deposited over the gate pad and the data pad which are exposed via contact hole (181,182). While forming the other contact hole in the coating layer, both the data pad and the gate pad can be exposed to etching process within the same time period.