| 摘要 |
A vapor deposition method is provided to improve functionalities of the nanoimprint stamps and substrates by forming a functional ultra-thin film on various matrices such as semiconductor, metal, polymer and glass surface using self-assembled monolayers in nanoimprint lithography, thereby controlling surface energy of nanoimprint stamps and substrates such as SiO2, Si, Ge, Au, Ag, Pt, GaAs, InP, InSb, Ni, PMMA, PET, TiO2 and Al2O3. A vapor deposition method of self-assembled monolayers for functionalization of surface in nanoimprint lithography comprises the steps of: cleaning a nanoimprint stamp or a substrate on which a self-assembled monolayer is to be formed; activating the surface of the stamp or substrate by performing a plasma treatment on a surface of the stamp or substrate that has passed through the cleaning step; injecting the surface of the stamp or substrate that has passed through the plasma treatment step into a chamber to deposit the self-assembled monolayer on the surface of the stamp or substrate using a silane compound or a thiol compound; and stabilizing the surface of the stamp or substrate having the self-assembled monolayer deposited thereon in the chamber, wherein one solvent of toluene(C7H8) and isopropanol((CH3)2CHOH) is mixed with the compound used in the deposition step to form a mixed solution having a concentration of 0.1 to 1M.
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