Deposition of conductive polymer and metallization of non-conductive substrates

摘要

The invention is directed to a process for metallizing a surface of a dielectric substrate with electrolytically plated copper metallization, the process comprising immersing the substrate in a composition comprising a precursor for forming an electrically conductive polymer, a source of copper ions for electrolytic deposition, and an acid, to form an electrically conductive polymer on the surface of the dielectric substrate, and supplying an external source of electrons to electrolytically deposit copper over said electrically conductive polymer.