发明名称 Schottky barrier diode and method thereof
摘要 Pt/n<SUP>-</SUP>GaN Schottky barrier diodes are disclosed that are particularly suited to serve as ultra-violet sensors operating at wavelengths below 200 nm. The Pt/n<SUP>-</SUP>GaN Schottky barrier diodes have very large active areas, up to 1 cm<SUP>2</SUP>, which exhibit extremely low leakage current at low reverse biases. Very large area Pt/n<SUP>-</SUP>GaN Schottky diodes of sizes 0.25 cm<SUP>2 </SUP>and 1 cm<SUP>2 </SUP>have been fabricated from n<SUP>-</SUP>/n<SUP>+</SUP> GaN epitaxial layers grown by vapor phase epitaxy on single crystal c-plane sapphire, which showed leakage currents of 14 pA and 2.7 nA, respectively for the 0.25 cm<SUP>2 </SUP>and 1 cm<SUP>2 </SUP>diodes both configured at a 0.5V reverse bias.
申请公布号 US7341932(B2) 申请公布日期 2008.03.11
申请号 US20050251531 申请日期 2005.09.30
申请人 THE UNITED STATES OF AMERICA AS REPRESENTED BY THE ADMINISTRATOR OF THE NATIONAL AERONAUTICS AND SPACE ADMINISTRATION 发明人 ASLAM SHAHID;FRANZ DAVID
分类号 H01L21/28 主分类号 H01L21/28
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