发明名称 |
Ion beam current monitoring |
摘要 |
An ion beam monitoring system includes a charge neutralization system and a sensor. The charge neutralization system is configured to provide a compensating current to control a charge on a front surface of a wafer. The sensor is configured to sense the compensating current and provide a sensor signal in response to the compensating current, wherein the sensor signal is representative of a beam current of an ion beam. The charge neutralization system may include a plasma flood gun configured to provide the compensating current to the ion beam.
|
申请公布号 |
US7342240(B2) |
申请公布日期 |
2008.03.11 |
申请号 |
US20060361765 |
申请日期 |
2006.02.24 |
申请人 |
VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. |
发明人 |
WALTHER STEVEN R.;EVANS MORGAN |
分类号 |
H01J37/317;H01J37/304 |
主分类号 |
H01J37/317 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|