发明名称 BURIED CONDUCTOR FOR IMAGERS
摘要 A pixel cell having (200) a photo-conversion device (21) at a surface of a substrate (11) and at least one contact area (277) from which charge or a signal is output or received. A first insulating layer (233) is located over the photo-conversion device and the at least one contact area. The pixel cell further includes at least one conductor in contact with the at least one contact area. The conductor includes a polysilicon material (271) extending through the first insulating layer and in contact with the at least one contact area. Further, a conductive material (272), which includes at least one of a suicide and a refractory metal, can be over and in contact with the polysilicon material. ® KIPO & WIPO 2008
申请公布号 KR20080022225(A) 申请公布日期 2008.03.10
申请号 KR20087002377 申请日期 2006.06.20
申请人 MICRON TECHNOLOGY, INC. 发明人 RHODES HOWARD E.
分类号 H01L27/146;H01L31/02 主分类号 H01L27/146
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