发明名称 GAS SUPPLY SYSTEM FOR SEMICONDUCTOR MANUFACTURING EQUIPMENT AND GAS SUPPLY CHANGING METHOD
摘要 A gas supply system for semiconductor manufacturing equipment having a gas supply switching unit and a gas supply switching method using the same are provided to prevent an accident due to leakage of a process gas by removing previously a cause of gas leakage. A gas supply system includes one or plural first gas supply units, a first gas supply line, a second gas supply line(150), one or plural second gas supply tubes(100), and a gas supply switching unit. The first gas supply line is formed to connect the first gas supply unit and a main body to each other. A first valve is installed in the first gas supply line. The second gas supply line is connected to the first gas supply line. A second valve is installed in the second gas supply line. The second gas supply unit is connected to the second gas supply line. The gas supply switching unit senses the residual amount of first gas and supplies the second gas of the second gas supply unit to the main body according to the sensed result.
申请公布号 KR20080021261(A) 申请公布日期 2008.03.07
申请号 KR20060084373 申请日期 2006.09.01
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 AHN, SEUNG KOOK;KIM, HO WANG;NAM, TAE YOUNG
分类号 H01L21/02 主分类号 H01L21/02
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