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发明名称
Contamination removal system at gas for Semiconductor clean rooms
摘要
申请公布号
KR200438683(Y1)
申请公布日期
2008.03.07
申请号
KR20070007080U
申请日期
2007.04.30
申请人
发明人
分类号
H01L21/00;H01L21/02
主分类号
H01L21/00
代理机构
代理人
主权项
地址
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