| 摘要 |
In a first aspect, a first abatement apparatus is provided. The first abatement apparatus includes an oxidation unit (108) adapted to receive an effluent stream from a semiconductor device manufacturing chamber; a first water scrubber unit (110) adapted to receive the effluent stream from the oxidation unit; and a catalysis unit (112) adapted to receive the effluent stream from the first water scrubber unit. Numerous other aspects are provided. ® KIPO & WIPO 2008
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