PROCESSING GAS SUPPLYING METHOD AND DEVICE, SUBSTRATE PROCESSING METHOD AND DEVICE, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIA

摘要

PROBLEM TO BE SOLVED: To provide a processing gas supplying method for stably supplying the processing gas comprising an organic compound, a substrate processing method using the processing gas supplying method, a method for manufacturing a semiconductor device using the substrate processing method, a processing gas supplying device for stably supplying the processing gas comprising the organic compound, a substrate processing device using the processing gas supplying device, and a recording media with the program for operating the substrate processing device written. SOLUTION: The processing gas supplying method comprises a first step for evaporating and sublimating a raw material comprising the organic compound, a second step for generating a first reaction for monomerizing the monomer to a multimer or a second reaction for polymerizing the monomer to the polymer by controlling the pressure or the temperature of the processing gas, and a third step for supplying the processing gas to the predetermined processing space. COPYRIGHT: (C)2008,JPO&INPIT