发明名称 |
Pattern Inspection Method And Apparatus |
摘要 |
An apparatus for processing a defect candidate image, including: a scanning electron microscope for taking an enlarged image of a specimen by irradiating and scanning a converged electron beam onto the specimen and detecting charged particles emanated from the specimen by the irradiation; an image processor for processing the image taken by the scanning electron microscope to detect defect candidates on the specimen and classify the detected defect candidates into one of plural classes; a memory for storing output from the image processor including images of the detected defect candidates; and a display unit which displays information stored in the memory and an indicator, wherein the display unit displays a distribution of the detected and classified defect candidates in a map format by distinguishing by the classified class, and the display unit also displays an image of a defect candidate stored in the memory together with the map which is indicated on the map by the indicator.
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申请公布号 |
US2008056559(A1) |
申请公布日期 |
2008.03.06 |
申请号 |
US20070931856 |
申请日期 |
2007.10.31 |
申请人 |
HIROI TAKASHI;WATANABE MASAHIRO;SHISHIDO CHIE;SUGIMOTO ARITOSHI;TANAKA MAKI;MIYAI HIROSHI;KUNI ASAHIRO;NARA YASUHIKO |
发明人 |
HIROI TAKASHI;WATANABE MASAHIRO;SHISHIDO CHIE;SUGIMOTO ARITOSHI;TANAKA MAKI;MIYAI HIROSHI;KUNI ASAHIRO;NARA YASUHIKO |
分类号 |
G01B11/24;G06K9/00;G01N21/956;G01R31/311;G06T1/00;G06T7/00;H01L21/66 |
主分类号 |
G01B11/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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