| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a negative resist material, in particular, a chemically amplified negative resist material that can exhibit higher resolution than conventional hydroxy styrene or novolac negative resist materials, that provides excellent pattern profiles after being exposed and that exhibits excellent etching resistance; and a patterning process that uses the resist material. <P>SOLUTION: The negative resist material comprises, at least, a polymer comprising a repeating unit of hydroxy vinylnaphthalene represented by general formula (1). <P>COPYRIGHT: (C)2008,JPO&INPIT |
