| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for cleaning a storage case to be used when a mask substrate such as a photomask or photomask blanks, a semiconductor substrate such as a wafer for a semiconductor or the like, a pellicle, and the like are stored or carried, wherein it is easy to clean periodically, this method can be applied to a case having a complicated shape, a large-scaled device or expensive device is not required, an environmental measure is easy, and a cleaning effect is high. <P>SOLUTION: In the method for cleaning the storage case which is contaminated by an adhesion of a contaminant of a physically attracted organic matter, an ionic contaminant or an ion crystalline contaminant, the containment case is stationarily placed in an air current of a clean air or inactive gas in a temperature range of a normal temperature to 80°C and the contaminant adhered to the containment case is removed by an elimination. <P>COPYRIGHT: (C)2008,JPO&INPIT |
