发明名称 EXPOSURE APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of quickly correcting a frame due to a secular change and an installment condition. <P>SOLUTION: The exposure apparatus corrects by comparing a light receiving position of light receiving parts PDx and PDy with a stored light receiving position and discriminating that the frame 3 is deformed if they are different. The correction moves a second tapered part 2b of any one of height adjustment devices along a surface plate G, and raises or lowers a first tapered part 2a due to wedge action. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008052006(A) 申请公布日期 2008.03.06
申请号 JP20060227492 申请日期 2006.08.24
申请人 NSK LTD 发明人 NAKAMURA TAKESHI
分类号 G03F9/00;G03F7/20;H01L21/027 主分类号 G03F9/00
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