| 摘要 |
PROBLEM TO BE SOLVED: To provide a device for feeding a vapor deposition material, which enables a vapor deposition apparatus to stably and continuously vapor-deposit the material on a substrate for a long period of time and shows superior practicality. SOLUTION: The device for feeding the vapor deposition material is installed in the vapor deposition apparatus which heats the vapor deposition material 2 filled in a vaporizing source 1 installed in a vacuum chamber to vaporize the material 2 and deposit it on a substrate, and feeds the vapor deposition material 2 to the vaporizing source 1. The device comprises: a material-storing body 3 which stores the vapor deposition material 2 to be fed; and an introduction supply port 4 which introduces and feeds the vapor deposition material 2 to be fed into the vaporizing source 1 provided in the material-storing body 3. The introduction supply port 4 or the material-storing body 3 is arranged so as to freely come into contact with and leave from the vaporizing source 1. The introduction supply port 4 is structured to be switchable between a close feeding state of being close to the vaporizing source 1 and a separated and retracted state of being apart from the vaporizing source 1. COPYRIGHT: (C)2008,JPO&INPIT
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