发明名称 PLASMA IRRADIATION DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To directly irradiate plasma toward the surface from the vicinity of a treated material without being interfered even if an electron optical mechanism is installed toward a surface of the treated material or even if a detector to detect secondary electrons is installed in the vicinity of the treated material. <P>SOLUTION: A plasma irradiation device is provided with plasma generating tubes 30, 40 in which plasma is generated by introducing gas molecules and by exciting these, and electrodes 33, 43 in which the gas molecules in these plasma generating tubes 30, 40 are excited, and the plasma is emitted from one end of the plasma generating tubes 30, 40. Then, toward the treated material 6 installed in a vacuum chamber 1 from one end of the plasma generating tubes 30, 40, cylindrical extension nozzles 31, 41 for plasma radiation are extended. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008052911(A) 申请公布日期 2008.03.06
申请号 JP20060224842 申请日期 2006.08.22
申请人 SHINKU DEVICE:KK 发明人 YOSHIDA TOSHIHARU
分类号 H05H1/46;C23C16/50;H01J37/32;H01L21/3065 主分类号 H05H1/46
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