发明名称 THIN-FILM-FORMING APPARATUS
摘要 PROBLEM TO BE SOLVED: To solve such a problem that a thin-film-forming apparatus using a conventional electron beam heating system heats a metallic sample with low efficiency because the apparatus merely irradiates the surface of the metallic sample with an electron beam and then a number of electrons incident on the surface of the metallic sample are reflected and emitted to the outside of a crucible. SOLUTION: The thin-film-forming apparatus makes the reflected electron emitted from the first crucible accommodating the first sample to be irradiated with the electron beam directly be incident on the second sample placed in the second crucible to improve the heating efficiency for the samples. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008050667(A) 申请公布日期 2008.03.06
申请号 JP20060229552 申请日期 2006.08.25
申请人 MITSUBISHI ELECTRIC CORP 发明人 IZUMO MASAO
分类号 C23C14/30 主分类号 C23C14/30
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