发明名称 |
Methode zur Erzeugung eines Musters mittels einer Fotomaske, und Methode zur Erzeugung der entsprechenden Maskendaten |
摘要 |
The photomask of this invention includes, on a transparent substrate, a semi-shielding portion having a transmitting property against exposing light, a transparent portion having a transmitting property against the exposing light and surrounded with the semi-shielding portion, and an auxiliary pattern surrounded with the semi-shielding portion and provided around the transparent portion. The semi-shielding portion and the transparent portion transmit the exposing light in an identical phase with respect to each other. The auxiliary pattern transmits the exposing light in an opposite phase with respect to the semi-shielding portion and the transparent portion and is not transferred through exposure. <IMAGE> <IMAGE> <IMAGE> <IMAGE> <IMAGE> <IMAGE> <IMAGE> |
申请公布号 |
DE602004010249(T2) |
申请公布日期 |
2008.03.06 |
申请号 |
DE20046010249T |
申请日期 |
2004.05.12 |
申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO. LTD. |
发明人 |
MISAKA, AKIO |
分类号 |
G03F1/00;G03F1/26;G03F1/29;G03F1/32;G03F1/36;G03F1/68;H01L21/027 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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