| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resin composition with which a pattern gap of a resist pattern can be effectively made fine with high accuracy regardless of the surface state of a substrate, a pattern over the wavelength limit can be favorably, economically and inexpensively formed in a state with less pattern defects as well as the pattern shrinkage can be improved, and to provide a method for forming a fine pattern for efficiently forming a fine resist pattern by using the above resin composition. <P>SOLUTION: The resin composition for forming a fine pattern contains a resin containing a hydroxyl group, a crosslinking component, and an alcohol-based solvent containing alcohol and water by 10 wt.% or less of the whole solvent, wherein the resin composition contains a compound having two or more epoxy groups in the molecule as the crosslinking component. <P>COPYRIGHT: (C)2008,JPO&INPIT |
