| 摘要 |
PROBLEM TO BE SOLVED: To prevent a decrease in the dimension of a region of a substrate when a pseudo single crystal region having a strip-like crystal is formed on the substrate. SOLUTION: The method of manufacturing a display device includes a process of forming a pseudo single crystal having a strip-like crystal on a predetermined region of a semiconductor film formed on the substrate. The process includes a step of forming the pseudo single crystal by irradiating the first region of the semiconductor film with an energy beam while moving an irradiation position in a first direction, and a step of forming the pseudo single crystal by irradiating a second region of the semiconductor film with an energy beam while moving an irradiation position in a second direction opposite to the first direction. In each of the first and second regions, a dimension at a position where the irradiation of the energy beam is completed is smaller than a dimension at the position where the irradiation of the energy beam is started, and the second region has a portion overlapping with the first region and a portion not overlapping therewith. COPYRIGHT: (C)2008,JPO&INPIT |
