| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and an apparatus for applying a colored photoresist by which the difference of film thickness between the thickness of a coating film on a part brougt into contact with a vacuum table 31 and the thickness of a coating film on a part not brought into contact with the vacuum table and corresponding to a position of an opening part 34 does not occur and then, the unevenness of appearance (density) due to the opening part of a color filter is not observed. SOLUTION: The method comprises the steps of: setting the temperature of a glass substrate 22 to the temperature of the vacuum table before the glass substrate 22 is placed on the vacuum table. A mechanism for setting the temperature of the substrate to the temperature of the vacuum table is a temperature control chamber 80. The temperature of the vacuum table is controlled. COPYRIGHT: (C)2008,JPO&INPIT |
