发明名称 Method of Aberration Correction and Electron Beam System
摘要 There is disclosed an electron beam system in which the third-order aberration S<SUB>3 </SUB>with two-fold symmetry is corrected. If a C<SUB>s </SUB>corrector is operated, parasitic aberration S<SUB>3 </SUB>(third-order aberration S<SUB>3 </SUB>with two-fold symmetry) is produced. A corrective third-order aberration S<SUB>3</SUB>' with two-fold symmetry that cancels out the parasitic aberration S<SUB>3 </SUB>is produced within a multipole element to correct the parasitic aberration S<SUB>3</SUB>. The electron beam is tilted relative to the optical axis within the multipole element producing a hexapole field. The corrective third-order aberration S<SUB>3</SUB>' with two-fold symmetry is introduced in each electron forming the tilted electron beam.
申请公布号 US2008054186(A1) 申请公布日期 2008.03.06
申请号 US20070847595 申请日期 2007.08.30
申请人 JEOL LTD. 发明人 HOSOKAWA FUMIO
分类号 H01J37/153 主分类号 H01J37/153
代理机构 代理人
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