| 摘要 |
A method for designing a semiconductor device includes: based on information on layout of a resistive element and information on layout of wiring disposed on a layer above the resistive element when seen in section, determining whether or not the resistive element and the wiring overlap each other when seen from above; and if it is determined that there is an overlap between the resistive element and the wiring when seen from above, changing at least one of the layout of the resistive element and the layout of the wiring so as to eliminate the overlap.
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