发明名称 GETTER AND CLEANING ARRANGEMENT FOR A LITHOGRAPHIC APPARATUS
摘要 A lithographic apparatus includes a radiation source and an object (301) with a first surface (302) which is configured to retain metal contaminants. This surface has the function of a getter. The first surface is arranged substantially outside the region traversed by the radiation beam generated by the radiation source during lithographic processing. The first surface may further be used to retain volatile contaminants generated in a cleaning method.
申请公布号 WO2008007952(A3) 申请公布日期 2008.03.06
申请号 WO2007NL50318 申请日期 2007.06.28
申请人 ASML NETHERLANDS B.V.;VAN HERPEN, MAARTEN, MARINUS, JOHANNES, WILHELMUS;BANINE, VADIM, YEVGENYEVICH;MOORS, JOHANNES, HUBERTUS, JOSEPHINA;SOER, WOUTER, ANTHON 发明人 VAN HERPEN, MAARTEN, MARINUS, JOHANNES, WILHELMUS;BANINE, VADIM, YEVGENYEVICH;MOORS, JOHANNES, HUBERTUS, JOSEPHINA;SOER, WOUTER, ANTHON
分类号 G03F7/20;B08B7/00 主分类号 G03F7/20
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