发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR PREPARING SAME |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition capable of suppressing leaching or bleeding-out of a reaction catalyst from a cured product and a method for preparing the same. <P>SOLUTION: The photosensitive resin composition comprises a polymerizable unsaturated double bond-containing polymer obtained by ring-opening addition reaction of a copolymer having an acid group and an epoxy compound having a polymerizable unsaturated double bond, and a tertiary amine having a polymerizable unsaturated double bond. <P>COPYRIGHT: (C)2008,JPO&INPIT |
申请公布号 |
JP2008052043(A) |
申请公布日期 |
2008.03.06 |
申请号 |
JP20060228060 |
申请日期 |
2006.08.24 |
申请人 |
NIPPON SHOKUBAI CO LTD |
发明人 |
AWAJI TOSHIO;TANIGAWA NORIYUKI |
分类号 |
G03F7/027;C08F290/02;G02B5/20;G03F7/004 |
主分类号 |
G03F7/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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