发明名称 LIQUID EJECTION DEVICE AND GAS TREATING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a liquid ejection device which can detect gas in a common liquid chamber for feeding liquid to each pressure chamber and a dissolved gas amount in the liquid in the common liquid chamber with high accuracy, and can avoid a large amount of ink consumption at the time of recovering action to cope with gas generation in the common liquid chamber, and to provide a gas treating method. SOLUTION: According to the structure of the liquid ejection device, a gas discharging chamber 104 partitioned by a diaphragm 102 is formed on an upper surface of the common liquid chamber 55, and a gas reservoir 100 on an upper area of the common liquid chamber 55 communicates with the gas discharging chamber 104 via a gas channel 106. Then a gas channel valve 108 arranged across the gas channel 106 is released for a constant time period to prepare bubbles in the gas discharging chamber 104, and an internal pressure of the bubbles is detected by a bubble pressure sensor 110, to thereby detect presence/absence of the gas in the gas reservoir 100. If the gas is present in the gas storage section 100, the gas channel valve 108 is released to move the gas in the gas reservoir 100 to the gas discharging chamber 104, and the gas is dissolved in ink present in the gas discharging chamber 104. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008049672(A) 申请公布日期 2008.03.06
申请号 JP20060230934 申请日期 2006.08.28
申请人 FUJIFILM CORP 发明人 KATADA MASATO
分类号 B41J2/175;B05C5/00;B05C11/10;B41J2/045;B41J2/055;B41J2/18;B41J2/185 主分类号 B41J2/175
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