| 摘要 |
PROBLEM TO BE SOLVED: To provide a liquid processing apparatus capable of making the footprint small and uniformly exhausting air over complete periphery of an exhaust cup without requiring provision of a special isolation mechanism for isolating exhaust and drain. SOLUTION: In a liquid processing apparatus, an annular drain cup 51 is provided so that a rotation cup 4 is configured to rotate a wafer W in a unified manner and the outside of the rotation cup 4 is surrounded. Further, an exhaust cup 52 is concentrically provided so that the exhaust cup 52 incorporates the drain cup 51, and an air current adjustment mechanism 99a and 97 for adjusting an air current is provided so that the air current of a gas component taken into the exhaust cup 52 flows from almost complete periphery toward an exhaust opening 70. The liquid processing apparatus carries out a liquid treatment with supplying a treatment liquid to the wafer W. COPYRIGHT: (C)2008,JPO&INPIT
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