| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for easily preparing a colloidal particle arrangement structure with few arrangement defects and high regularity, and an apparatus. SOLUTION: The method comprises (a) the step of preparing a cover member 3 provided with an edge part 8, (b) the step of supporting the cover member 3 so as to form a clearance between the edge part 8 and a substrate 2 such that the edge part 8 is opposed to the substrate 2 while providing a clearance on the substrate 2 and forming an acute angleαrelative to the substrate, (c) the step of storing a colloidal solution in a predetermined space portion 7 between the cover member 3 and the substrate 2, (d) the step of leaking out the colloidal solution stored in the space portion 7 from the clearance 9 between the edge part 8 and the substrate 2 to the outside by performing a relative slide motion of the cover member 3 and the substrate 2 in a predetermined direction and arranging the colloidal particle on the substrate 2. COPYRIGHT: (C)2008,JPO&INPIT
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