发明名称 Methods and systems for selectively filling apertures in a substrate to form conductive vias with a liquid using a vacuum
摘要 Methods of forming a conductive via in a substrate include contacting the substrate with a wave of conductive liquid material, such as molten solder, and drawing the liquid material into the aperture with a vacuum. The wave may be formed by flowing the liquid material out from an outlet in a direction generally against the gravitational field. The liquid material may be solidified to form an electrically conductive structure. A plurality of apertures may be selectively filled with the liquid material one at a time, and liquids having different compositions may be used to provide conductive vias having different compositions in the same substrate. Systems for forming conductive vias include a substrate fixture, a vacuum device having a vacuum fixture, and a solder dispensing device configured to provide a wave of molten solder material. Relative lateral and vertical movement is provided between the wave of molten solder and a substrate supported by the substrate fixture.
申请公布号 US2008057691(A1) 申请公布日期 2008.03.06
申请号 US20060511619 申请日期 2006.08.29
申请人 发明人 DANDO ROSS S.;OLIVER STEVEN;BORTHAKUR SWARNAL;HUTTO KEVIN
分类号 H01L21/44 主分类号 H01L21/44
代理机构 代理人
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