发明名称 Insulation film manufacturing method, reaction device, power generation device and electronic apparatus
摘要 Disclosed is a reaction device that includes a metal substrate and an R<SUB>2</SUB>O<SUB>3 </SUB>film. The R<SUB>2</SUB>O<SUB>3 </SUB>film has a crystal structure structured with at least one rare earth element R selected from the group including Sc, Y, La, Gd, Dy, Ho, Er, Tm, and Lu. The R<SUB>2</SUB>O<SUB>3 </SUB>film is formed on at least a portion of a surface of the metal substrate where an insulation property is needed.
申请公布号 US2008057196(A1) 申请公布日期 2008.03.06
申请号 US20070893277 申请日期 2007.08.15
申请人 CASIO COMPUTER CO., LTD. 发明人 ISHIKAWA TETSUSHI;FUJITA TSUYOSHI;NAKAMURA OSAMU
分类号 C23C16/00;B05C1/00;B05D3/00 主分类号 C23C16/00
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