发明名称 INSULATING TARGET MATERIAL, METHOD OF MANUFACTURING INSULATING TARGET MATERIAL, INSULATING COMPLEX OXIDE FILM, AND DEVICE
摘要 <p>An insulating target material for obtaining an insulating complex oxide film represented by a general formula AB 1-X C X O 3 , an element A including at least Pb, an element B including at least one of Zr, Ti, V, W, and Hf, and an element C including at least one of Nb and Ta.</p>
申请公布号 KR100810856(B1) 申请公布日期 2008.03.06
申请号 KR20060082240 申请日期 2006.08.29
申请人 发明人
分类号 H01B3/10;C04B35/49;C23C14/34;H01L21/8246;H01L27/10;H01L27/105;H01L41/09;H01L41/18;H01L41/187;H01L41/316;H01L41/317;H01L41/333;H01L41/39 主分类号 H01B3/10
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