System and method for analyzing a light beam of a wafer inspection tool or an exposure tool

摘要

A system operable to detect a light beam generated by a light source includes a substrate that comprises a wafer operable to be inspected by a wafer inspection tool or exposed by an exposure tool. One or more image sensors are disposed outwardly from the substrate. An image sensor of the one or more image sensors is operable to detect a light beam and generate a sensor signal representing the detected light beam.