| 摘要 |
PROBLEM TO BE SOLVED: To provide an electron beam inspection device and method in which a highly sensitive inspection by fine pixels can be conducted efficiently while a stage is scan-shifted. SOLUTION: In the electron beam inspection device, a stage shifting speed can be adjusted irrespective of a limit of electron beam deflection frequency by scanning electron beam in the same direction (a horizontal direction) with a direction of scan-shifting of the stage. An image acquiring width in acquiring continuously an image of a strip shape in a stage shifting direction is decided by a scanning pitch, namely a pixel size and a scanning number, and for example, if a scanning number is set at one half, a stage speed can be made two times. COPYRIGHT: (C)2008,JPO&INPIT
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