APPARATUS AND METHOD FOR DRYING UNDER REDUCED PRESSURE

摘要

PROBLEM TO BE SOLVED: To provide an apparatus for drying under reduced pressure, efficiently drying photosensitive material and simplifying a processing line for a substrate. SOLUTION: This apparatus 10 for drying under reduced pressure is adapted to dry the photosensitive material applied to the upside of the substrate W on the substrate. The apparatus for drying under reduced pressure includes: a drying chamber 20 having an inlet 26 for receiving the substrate and an outlet 27 for discharging the substrate; an inlet opening and closing means 31 for opening and closing the inlet of the drying chamber; an outlet opening and closing means 34 for opening and closing the outlet of the drying chamber; a conveying roller 51 capable of conveying the substrate from the inlet to the outlet in the drying chamber; and a pressure reducing means 40 connected to the drying chamber to reduce the pressure in the drying chamber. In the drying chamber, the outlet and the inlet are separately provided. COPYRIGHT: (C)2008,JPO&INPIT