发明名称 BIMORPHIC STRUCTURES, SENSOR STRUCTURES FORMED THEREWITH, AND METHODS THEREFOR
摘要 A bimorphic structure responsive to changes in an environmental condition, sensor structures incorporating one or more of such bimorphic structures, and a method of forming such bimorphic structures. The sensor structure has an electrically-conductive first contact on a substrate, and a bimorph beam anchored to the substrate so that a portion thereof is suspended above the first contact. The bimorph beam has a multilayer structure that includes first and second layers, with the second layer between the first layer and the substrate. A portion of the first layer projects through an opening in the second layer toward the first contact so as to define an electrically-conductive second contact located on the beam so as to be spaced apart and aligned with the first contact for contact with the first contact when the beam sufficiently deflects toward the substrate.
申请公布号 US2008054756(A1) 申请公布日期 2008.03.06
申请号 US20070848336 申请日期 2007.08.31
申请人 EVIGIA SYSTEMS, INC. 发明人 GOGOI BISHNU P.;YAZDI NAVID
分类号 H02N10/00;H01H11/00 主分类号 H02N10/00
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