发明名称 |
ETCH METHODS TO FORM ANISOTROPIC FEATURES FOR HIGH ASPECT RATIO APPLICATIONS |
摘要 |
Methods for forming anisotropic features for high aspect ratio application in etch process are provided in the present invention. The methods described herein advantageously facilitates profile and dimension control of features with high aspect ratios through a sidewall passivation management scheme. In one embodiment, sidewall passivations are managed by selectively forming an oxidation passivation layer on the sidewall and/or bottom of etched layers. In another embodiment, sidewall passivation is managed by periodically clearing the overburden redeposition layer to preserve an even and uniform passivation layer thereon. The even and uniform passivation allows the features with high aspect ratios to be incrementally etched in a manner that pertains a desired depth and vertical profile of critical dimension in both high and low feature density regions on the substrate without generating defects and/or overetching the underneath layers.
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申请公布号 |
US2008057729(A1) |
申请公布日期 |
2008.03.06 |
申请号 |
US20070926531 |
申请日期 |
2007.10.29 |
申请人 |
SHEN MEIHUA;LEUCKE UWE;JIN GUANGXIANG;WANG XIKUN;LIU WEI;WILLIAMS SCOTT |
发明人 |
SHEN MEIHUA;LEUCKE UWE;JIN GUANGXIANG;WANG XIKUN;LIU WEI;WILLIAMS SCOTT |
分类号 |
H01L21/465 |
主分类号 |
H01L21/465 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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