发明名称 |
DRY FILM PHOTORESIST RESIN COMPOSITION HAVING ENHANCED ADHESION |
摘要 |
<p>A resin composition for a dry film photoresist is provided to improve adhesion while maintaining other physical properties including resolution and hardness. A resin composition for a dry film photoresist comprises a copolymer containing allyl glycidyl ether as a polymer binder. The polymer binder is used in an amount of 15-40 wt% based on the total weight of the resin composition for a dry film photoresist. The allyl glycidyl ether comprises 5-50 wt% of the polymer binder on the solid content basis.</p> |
申请公布号 |
KR20080019888(A) |
申请公布日期 |
2008.03.05 |
申请号 |
KR20060082381 |
申请日期 |
2006.08.29 |
申请人 |
KOLON INDUSTRIES, INC. |
发明人 |
JHO, SEUNG JE;HAN, KOOK HYEON |
分类号 |
G03F7/004;G03F7/032 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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