发明名称 DRY FILM PHOTORESIST RESIN COMPOSITION HAVING ENHANCED ADHESION
摘要 <p>A resin composition for a dry film photoresist is provided to improve adhesion while maintaining other physical properties including resolution and hardness. A resin composition for a dry film photoresist comprises a copolymer containing allyl glycidyl ether as a polymer binder. The polymer binder is used in an amount of 15-40 wt% based on the total weight of the resin composition for a dry film photoresist. The allyl glycidyl ether comprises 5-50 wt% of the polymer binder on the solid content basis.</p>
申请公布号 KR20080019888(A) 申请公布日期 2008.03.05
申请号 KR20060082381 申请日期 2006.08.29
申请人 KOLON INDUSTRIES, INC. 发明人 JHO, SEUNG JE;HAN, KOOK HYEON
分类号 G03F7/004;G03F7/032 主分类号 G03F7/004
代理机构 代理人
主权项
地址